Engineering Materials and Processes phần 3 docx

Diffusion Barriers and Self-encapsulation 19

Figure 3.2. Dealloying kinetics obtained with Ag(26 at.% Ti) alloy films. The residual Ti

concentration is shown as a function of annealing time for three different temperatures. The

annealing took place in a NH3 ambient and the data was obtained using 2.0 MeV He+2

RBS

[9].

Resistivity versus annealing time for an Ag(19 at.% Ti) alloy, annealed at three

different temperatures is shown in Figure 3.3. The resistivity drops rapidly within

the first 10 minutes from the high value (~109.0 µΩ-cm) of the as-deposited

sample to ~8 µΩ-cm at 500°C. The initial rapid drop is temperature dependent and

the resistivity change is much slower for longer annealing times. This behavior is

observed for alloy concentrations of 6–26 at.%.